CNx/TiNy multilayers have been prepared by ion beam sputtering and analyzed
by X-ray diffraction, transmission electron microscopy, selected area elec
tron diffraction, energy dispersive X-ray and X-ray photoemission spectrosc
opy. The structure analyses shows that the films may contain several differ
ent kinds of C-N crystals embedded in the amorphous matrix. These crystals
have hexagonal and cubic crystalline structures. The TiNx layer in multilay
ers is primarily amorphous and contains only a few dispersed Ti2N crystals.
The thickness of CN, and TiNy layers in the CNx/TiNy multilayers is about
20 and 30 nm, respectively. The atomic ratios of [N]/([C] + [N] + [Til) in
the multilayers vary from 20 to 41 at%. The bonding ratios of C - N/C = N o
f the CN, layer in multilayers reach 0.447 or 0.585 as calculated from the
C1s and N1s X-ray photoemission spectra, respectively. (C) 2001 Published b
y Elsevier Science B.V.