The goal of this study was to investigate the roles of methyl radicals and
acetylene, either individually or together, during diamond growth by chemic
al vapor deposition. We have nucleated and grown micron-sized diamond parti
cles at 800 degreesC in a flow-tube apparatus that permits growth from only
methyl radicals or acetylene in atomic hydrogen, in contrast to the comple
x mixture of species found in a normal reactor. Growth from methyl radicals
only produced cubo-octahedral crystals with an alpha value (root3 x the ra
tio of growth rates in the [1 0 0] and [1 1 1] directions) near 1.8, indica
ting that the absence of acetylene is not a significant impediment in nucle
ating new (I 1 1) planes, in contradiction to recent modeling work. Diamond
growth from pure acetylene produced octahedra (alpha = 3), indicating that
(1 0 0) growth is much more facile than (1 1 1) growth in the absence of m
ethyl radicals, and the (1 1 1) facets had a high concentration of contact
twins. Diamond growth from acetylene plus methane produced cubo-octahedra c
rystals but the highly defective [1 1 1] growth persisted. We propose that
at steady state the (1 1 1) growth surface has a high coverage of adsorbed
hydrocarbons, rather than resembling the simple hydrogen-terminated (1 1 1)
-1 x 1 : H structure; that steric repulsion and rearrangements play a criti
cal role in the growth mechanism; and that desorption and etching of adsorb
ed hydrocarbons by atomic hydrogen is less facile than has been commonly su
pposed. The ratio of C-2 and C-1 gas-phase precursors should be minimized f
or high quality [1 1 1] epitaxy. (C) 2001 Elsevier Science B.V. All rights
reserved.