A. Koukitu et Y. Kumagai, Thermodynamic analysis of group III nitrides grown by metal-organic vapour-phase epitaxy (MOVPE), hydride (or halide) vapour-phase epitaxy (HVPE) andmolecular beam epitaxy (MBE), J PHYS-COND, 13(32), 2001, pp. 6907-6934
An analysis of element incorporation from a thermodynamic viewpoint is desc
ribed for the vapour-phase epitaxy (metal-organic vapour-phase epitaxy (MOV
PE), hydride (or halide) vapour-phase epitaxy (HVPE) and molecular beam epi
taxy (MBE)) of group III nitrides. The driving force of binary nitrides and
the vapour-solid distribution relationship for ternary and quaternary nitr
ides are discussed. It is shown that the growth rate and alloy composition
of group III nitrides are thermodynamically controlled. The thermodynamical
ly predicted orders in which binary nitrides incorporate into alloys are ve
ry similar for all epitaxial methods and the order is basically governed by
the Gibbs free energy of formation of the binary nitrides irrespective of
the growth method.