Recent topics in the growth of group III nitrides by MOVPE are reviewed. Th
e process of low-temperature deposition of the buffer layer and the effect
of the low-temperature-deposited interlayer on the growth of AlGaN are disc
ussed. The growth of AlGaN on grooved GaN and on substrates is reviewed. Fi
nally, recent topics on the growth of In-containing alloys in terms of the
future aspects of new devices are presented.