GaN-based blue laser diodes

Citation
T. Miyajima et al., GaN-based blue laser diodes, J PHYS-COND, 13(32), 2001, pp. 7099-7114
Citations number
56
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
13
Issue
32
Year of publication
2001
Pages
7099 - 7114
Database
ISI
SICI code
0953-8984(20010813)13:32<7099:GBLD>2.0.ZU;2-0
Abstract
We report our recent progress on GaN-based high-power laser diodes (LDs), w hich will be applied as a light source in high-density optical storage syst ems. We have developed raised-pressure metal-organic chemical vapour deposi tion (R-P-MOCVD), which can reduce the threading-dislocation density in the GaN layer to several times 10(8) cm(-2), and demonstrated continuous-wave (cw) operation of GaN-based LD grown by RP-MOCVD. Furthermore, we found tha t the epitaxial lateral overgrowth (ELO) technique is useful for further re ducing threading-dislocation density to 10(6) cm(-2) and reducing the rough ness of the cleaved facet. By using this growth technique and optimizing de vice parameters, the lifetime of LDs was improved to more than 1000 hours u nder 30 mW cw operation at 60 degreesC. Our results proved that reducing bo th threading-dislocation density and consumption power is a valid approach to realizing a practical GaN-based LD. On the other hand, the practical GaN -based LD was obtained when threading-dislocation density in ELO-GaN was on ly reduced to 10(6) cm(-2), which is a relatively small reduction as compar ed with threading-dislocation density in GaAs- and InP-based LDs. We believ e that the multiplication of non-radiative centres is very slow in GaN-base d LDs, possibly due to the innate character of the GaN-based semiconductor itself.