We report our recent progress on GaN-based high-power laser diodes (LDs), w
hich will be applied as a light source in high-density optical storage syst
ems. We have developed raised-pressure metal-organic chemical vapour deposi
tion (R-P-MOCVD), which can reduce the threading-dislocation density in the
GaN layer to several times 10(8) cm(-2), and demonstrated continuous-wave
(cw) operation of GaN-based LD grown by RP-MOCVD. Furthermore, we found tha
t the epitaxial lateral overgrowth (ELO) technique is useful for further re
ducing threading-dislocation density to 10(6) cm(-2) and reducing the rough
ness of the cleaved facet. By using this growth technique and optimizing de
vice parameters, the lifetime of LDs was improved to more than 1000 hours u
nder 30 mW cw operation at 60 degreesC. Our results proved that reducing bo
th threading-dislocation density and consumption power is a valid approach
to realizing a practical GaN-based LD. On the other hand, the practical GaN
-based LD was obtained when threading-dislocation density in ELO-GaN was on
ly reduced to 10(6) cm(-2), which is a relatively small reduction as compar
ed with threading-dislocation density in GaAs- and InP-based LDs. We believ
e that the multiplication of non-radiative centres is very slow in GaN-base
d LDs, possibly due to the innate character of the GaN-based semiconductor
itself.