Application of temperature modulated relative dilatometry - Temperatures of adhesion degradation

Authors
Myslinski, P Kamasa, P Wasik, A
Citation
P. Myslinski et al., Application of temperature modulated relative dilatometry - Temperatures of adhesion degradation, J THERM ANA, 65(2), 2001, pp. 553-559
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
ISSN journal
13886150 → ACNP
Volume
65
Issue
2
Year of publication
2001
Pages
553 - 559
Database
ISI
SICI code
1388-6150(2001)65:2<553:AOTMRD>2.0.ZU;2-P
Abstract
Application of temperature modulated dilatometry (TM DIL) to investigation on degradation of the adhesion between ceramic films and the substrate is p resented. Layers of titanium nitride deposited by plasma assisted physical vapour deposition (PA PVD) methods on the Armco iron substrates were tested . This paper shows that the TM DIL method is helpful in determining the use fulness of the titanium nitride covering of the cutting tools and machine p arts.