Oxidation of NiFe(20 wt.%) thin films

Authors
Bruckner, W Baunack, S Hecker, M Thomas, J Groudeva-Zotova, S Schneider, CM
Citation
W. Bruckner et al., Oxidation of NiFe(20 wt.%) thin films, MAT SCI E B, 86(3), 2001, pp. 272-275
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
86
Issue
3
Year of publication
2001
Pages
272 - 275
Database
ISI
SICI code
0921-5107(20011003)86:3<272:OONWTF>2.0.ZU;2-I
Abstract
The oxidation of sputtered NiFe(20 wt.%, Permalloy) thin films with a thick ness of 180 mn was studied during annealing up to 400 degreesC for 2 h in a ir. The composition and the thickness of the oxide layer and the compositio nal change in the NiFe alloy laver as well as the microstructure of the fil m were investigated by Auger electron spectroscopy, X-ray diffraction, and transmission electron microscopy. Distinct oxidation starts at about 300 de greesC. The formed oxide layer consists of Fe2O3. The Fe concentration in t he NiFe layer decreases with the oxidation which leads to changes of the pr operties of this layer. (C) 2001 Else-vier Science B.V. All rights reserved .