Surface contamination by smearing during polishing - A PIXE study

Citation
Cb. Franklyn et Rkw. Merkle, Surface contamination by smearing during polishing - A PIXE study, NUCL INST B, 181, 2001, pp. 140-144
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
181
Year of publication
2001
Pages
140 - 144
Database
ISI
SICI code
0168-583X(200107)181:<140:SCBSDP>2.0.ZU;2-Z
Abstract
Preparation of samples for PIXE analysis follows standard procedures in ord er to present a smooth, uniform surface for microscopic investigation and a nalysis. Reports on the quality of the surface preparation are scant. We re port on investigations of preparation of metallic samples for micro-probe a nalysis. These samples are metal strips of typically 0.5 mm width and 10-15 mm length, sandwiched between natural pyrite crystals and quartz glass, mo unted in epoxy resin. The surface was polished using diamond abrasives. The smearing of metallic Ag, Au and Cu was investigated and was found to be mo st prevalent for Cu, but also clearly detectable for Ag and Au. The potenti al influence of beam halo and beam scattering in the resin mount appears to be negligible, but the results imply additional, as yet unidentified, fact ors besides smearing to explain all observations. (C) 2001 Elsevier Science B.V. All rights reserved.