Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N-2 plasma with graphite nozzle

Authors
de Graaf, A Aldea, E Dinescu, G van de Sanden, MCM
Citation
A. De Graaf et al., Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N-2 plasma with graphite nozzle, PLASMA SOUR, 10(3), 2001, pp. 524-529
Citations number
23
Categorie Soggetti
Physics
Journal title
PLASMA SOURCES SCIENCE & TECHNOLOGY
ISSN journal
09630252 → ACNP
Volume
10
Issue
3
Year of publication
2001
Pages
524 - 529
Database
ISI
SICI code
0963-0252(200108)10:3<524:IOPILE>2.0.ZU;2-I
Abstract
The chemistry of an argon/nitrogen thermal plasma expanding through a graph ite nozzle is investigated in order to unravel the role of plasma species i n the deposition (1-3 nm s(-1) rate) of non-hydrogenated amorphous carbon n itride (a-C:N) films. The spectral emission of plasma species is studied an d is used in combination with mass spectrometry and nozzle temperature meas urements to distinguish possible mechanisms of species production and excit ation.