V. Schulz-von Der Gathen et al., Diagnostic studies of species concentrations in a capacitively coupled RF plasma containing CH4-H-2-Ar, PLASMA SOUR, 10(3), 2001, pp. 530-539
Three plasma diagnostic methods, tunable infrared diode laser absorption sp
ectroscopy, optical emission spectroscopy and microwave interferometry have
been used to monitor concentrations of transient and stable molecules, CH3
, CH4, C2H2, C2H6, and of electrons in capacitively coupled CH4-H-2-Ar radi
ofrequency (RF) plasmas (f(RF) = 13.56 MHz, p = 100 Pa, phi (total)= 66 scc
m) for various discharge power values (P = 10-100 W) and gas mixtures. The
degree of dissociation of the methane precursor varied between 3% and 60%.
The methyl radical concentration was found to be in the order of 10(12) mol
ecules cm(-3) and the electron concentration in the order of loll cm(-3). T
he methyl radical concentration and the concentrations of the stable C-2 hy
drocarbons, C2H2 and C2H6, produced in the plasma, increased with discharge
power. The fragmentation rates of the methane precursor and conversion rat
es to the measured C-2 hydrocarbons were estimated in dependence on dischar
ge power. Radial distributions of the electron and methyl radical concentra
tions, and of the gas temperature were measured for the first time simultan
eously in the plasma region between the discharge electrodes. The measureme
nts allow us to draw qualitative conclusions on the main chemical processes
and the plasma chemical reaction paths.