Characterization of HVPE GaN layers by atomic force microscopy and Raman spectroscopy

Citation
R. Fornari et al., Characterization of HVPE GaN layers by atomic force microscopy and Raman spectroscopy, SEMIC SCI T, 16(9), 2001, pp. 776-782
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
16
Issue
9
Year of publication
2001
Pages
776 - 782
Database
ISI
SICI code
0268-1242(200109)16:9<776:COHGLB>2.0.ZU;2-J
Abstract
GaN layers were deposited on (0001) sapphire by hydride vapour phase epitax y (HVPE) and then extensively characterized by Raman spectroscopy and atomi c force microscopy. It was observed that the GaN epilayers directly deposit ed on sapphire generally have rough surfaces, mostly made of pyramids. The Raman scattering technique was found to be a powerful tool for quick and no n-destructive assessment of the crystallographic quality of HVPE GaN, altho ugh care must be taken in the spectra analysis as the surface morphology ca n affect the spectra structure. The absence of forbidden modes indicate tha t the surface is planar and smooth and the material is of good crystalline quality. A discussion on the observed red-shift of the A(1) (LO) mode frequ ency is presented.