Application of high intensity pulsed ion and plasma beams in modification of materials

Authors
Piekoszewski, J Werner, Z Szymczyk, W
Citation
J. Piekoszewski et al., Application of high intensity pulsed ion and plasma beams in modification of materials, VACUUM, 63(4), 2001, pp. 475-481
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
63
Issue
4
Year of publication
2001
Pages
475 - 481
Database
ISI
SICI code
0042-207X(20010816)63:4<475:AOHIPI>2.0.ZU;2-U
Abstract
Basic mechanisms of modification of materials subjected to irradiation by s hort (ns-ms), highly intense (10(5_)10(8) W/cm(2)) plasma or ion pulse beam s (HIPIPB) are reviewed. Description of basic phenomena occurring as a resu lt of beam-target interaction, and a representative selection of examples o f the HIPIPB processing of semiconductors, metals, ceramics, and other mate rials described in the literature are given. The HIPIPB processing is compa red to the laser processing. (C) 2001 Elsevier Science Ltd. All rights rese rved.