Generation of high-intensity pulsed ion and plasma beams for material processing

Authors
Werner, Z Piekoszewski, J Szymczyk, W
Citation
Z. Werner et al., Generation of high-intensity pulsed ion and plasma beams for material processing, VACUUM, 63(4), 2001, pp. 701-708
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
63
Issue
4
Year of publication
2001
Pages
701 - 708
Database
ISI
SICI code
0042-207X(20010816)63:4<701:GOHPIA>2.0.ZU;2-J
Abstract
The paper reviews the principles of operation of the present sources of hig h intensity pulsed ion and plasma beams. Limitations of the ion beam intens ity are presented. The concept of magnetic insulation is discussed in some detail. Methods of high-density plasma generation are outlined. Characteris tics of the existing devices are listed. It is shown that the existing sour ces cover a wide range of parameters and can be matched to almost any type of experiment on material processing. (C) 2001 Elsevier Science Ltd. All ri ghts reserved.