Precise and simple optical alignment method for double-sided lithography

Authors
Gruber, M Hagedorn, D Eckert, W
Citation
M. Gruber et al., Precise and simple optical alignment method for double-sided lithography, APPL OPTICS, 40(28), 2001, pp. 5052-5055
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
40
Issue
28
Year of publication
2001
Pages
5052 - 5055
Database
ISI
SICI code
0003-6935(20011001)40:28<5052:PASOAM>2.0.ZU;2-#
Abstract
A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is bas ed on optical self-imaging of special alignment marks and provides submicro meter accuracy. The method is simple and robust and can conveniently be imp lemented on laboratory mask aligners for contact or proximity printing. (C) 2001 Optical Society of America.