Microstructure evolution of electroless Ni-P and Ni-Cu-P deposits on Cu inthe presence of additives

Citation
Kl. Lin et al., Microstructure evolution of electroless Ni-P and Ni-Cu-P deposits on Cu inthe presence of additives, APPL SURF S, 181(1-2), 2001, pp. 166-172
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
181
Issue
1-2
Year of publication
2001
Pages
166 - 172
Database
ISI
SICI code
0169-4332(20010903)181:1-2<166:MEOENA>2.0.ZU;2-N
Abstract
The microstructures of electroless Ni-P and Ni-Cu-P deposits were investiga ted in the presence of thiourea and saccharin with AFM. The phosphorus cont ents and crystallinity of the deposits were investigated. Saccharin was fou nd to refine the nodular structure of the Ni-Cu-P deposit, while not affect ing the P% of the Ni-P and Ni-Cu-P deposits. On the other hand, thiourea wa s found to affect the P% and surface roughness of the Ni-P deposit. Thioure a does not exhibit nodular refining effect on the deposit. (C) 2001 Elsevie r Science B.V. All rights reserved.