Laser ablation of poly(methyl methacrylate) at 266 nm

Authors
Citation
Sw. Wee et Sm. Park, Laser ablation of poly(methyl methacrylate) at 266 nm, B KOR CHEM, 22(8), 2001, pp. 914-916
Citations number
12
Categorie Soggetti
Chemistry
Journal title
BULLETIN OF THE KOREAN CHEMICAL SOCIETY
ISSN journal
02532964 → ACNP
Volume
22
Issue
8
Year of publication
2001
Pages
914 - 916
Database
ISI
SICI code
0253-2964(20010820)22:8<914:LAOPMA>2.0.ZU;2-2