Molecular templating of nanoporous ultralow dielectric constant (approximate to 1.5) organosilicates by tailoring the microphase separation of triblock copolymers

Authors
Yang, S Mirau, PA Pai, CS Nalamasu, O Reichmanis, E Lin, EK Lee, HJ Gidley, DW Sun, JN
Citation
S. Yang et al., Molecular templating of nanoporous ultralow dielectric constant (approximate to 1.5) organosilicates by tailoring the microphase separation of triblock copolymers, CHEM MATER, 13(9), 2001, pp. 2762
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMISTRY OF MATERIALS
ISSN journal
08974756 → ACNP
Volume
13
Issue
9
Year of publication
2001
Database
ISI
SICI code
0897-4756(200109)13:9<2762:MTONUD>2.0.ZU;2-N
Abstract
Triblock polymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PPO-bPEO), are used as molecular templates in poly(methyl silsesquio xane) (MSQ) matrixes to fabricate nanoporous organosilicates. The triblock copolymers microphase-separate into nanometer domains as the MSQ matrix bec omes increasingly hydrophobic during a curing step. Extremely small pores ( 2-5 nm) are generated after thermally removing the template material. These materials attain ultralow dielectric constants (k approximate to 1.5) with electrical and mechanical integrity.