Time-of-flight photoelectron spectroscopy of atoms and molecules

Citation
Dw. Lindle et Oa. Hemmers, Time-of-flight photoelectron spectroscopy of atoms and molecules, J ALLOY COM, 328(1-2), 2001, pp. 27-34
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ALLOYS AND COMPOUNDS
ISSN journal
09258388 → ACNP
Volume
328
Issue
1-2
Year of publication
2001
Pages
27 - 34
Database
ISI
SICI code
0925-8388(20011004)328:1-2<27:TPSOAA>2.0.ZU;2-A
Abstract
Following the advent of third-generation synchrotron-radiation sources with ultra-high brightness and X-ray pulse widths of a few picoseconds, the tec hnique of time-of-flight (TOF) electron spectroscopy has experienced a dram atic enhancement in energy resolution. Using soft-X-ray beams focused to 10 0 mum or less, a new gas-phase TOF-photoelectron apparatus in operation at the Advanced Light Source (ALS) has demonstrated electron energy resolution as high as 8000 (E/DeltaE), comparable to some of the best electrostatic a nalyzers, while maintaining the traditional efficiency of the TOF technique . This apparatus is being used to probe limitations of basic approximations in X-ray photoemission: (1) the independent-particle approximation, and (2 ) the dipole approximation. In both cases, new limits of these approximatio ns have been discovered in unexpected photon-energy regimes. This paper inc ludes an over-view of the TOF technique as well as a summary of results fro m the ALS on limits of these basic approximations. (C) 2001 Elsevier Scienc e BY, All rights reserved.