Dynamics of nanoscale pattern formation of an epitaxial monolayer

Authors
Citation
W. Lu et Z. Suo, Dynamics of nanoscale pattern formation of an epitaxial monolayer, J MECH PHYS, 49(9), 2001, pp. 1937-1950
Citations number
22
Categorie Soggetti
Mechanical Engineering
Journal title
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS
ISSN journal
00225096 → ACNP
Volume
49
Issue
9
Year of publication
2001
Pages
1937 - 1950
Database
ISI
SICI code
0022-5096(200109)49:9<1937:DONPFO>2.0.ZU;2-L
Abstract
A two-phase monolayer grown on an elastic substrate may form stripes or dot s on the scale of nanometers. Sometimes these stripes and dots order into s uperlattices. This paper reports on a simulation on the basis of a model pr oposed by the authors recently, The size selection and spatial ordering res ult from two competing actions: the phase boundary energy tends to coarsen the phases, and the concentration-dependent surface stress tends to refine the phases. A nonlinear diffusion equation couples the concentration field in the epilayer and the stress field in the substrate. The simulation revea ls remarkably rich dynamics. An epilayer may evolve into various patterns, suggesting a significant degree of experimental control in growing nanoscal e superlattices, just as in growing atomic crystals. (C) 2001 Elsevier Scie nce Ltd. All rights reserved.