Multilayer alkoxysilane silylation of oxide surfaces

Citation
W. Yoshida et al., Multilayer alkoxysilane silylation of oxide surfaces, LANGMUIR, 17(19), 2001, pp. 5882-5888
Citations number
26
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
17
Issue
19
Year of publication
2001
Pages
5882 - 5888
Database
ISI
SICI code
0743-7463(20010918)17:19<5882:MASOOS>2.0.ZU;2-N
Abstract
Anhydrous silylation of vinyltrimethoxysilane (VTMS) onto silica and zircon ia substrates was investigated experimentally to demonstrate and quantify t he effects of surface water on multilayer silylation. Silylation coverage w as controlled by the availability of surface water, which is consumed in mu ltilayer silylation reactions. Silylation coverage increased with surface w ater coverage, reaching a maximum at approximately two monolayers of water. The subsequent decline in silylation coverage is attributed to the formati on of bulk polysilanes and the decreased accessibility of the water-bearing surface to the hydrophobic VTMS molecules. Atomic force microscopy images revealed a nanometer-scale clusterlike surface morphology consistent with t he formation of bonded polysilanes. The present study suggests that multila yered silylated surfaces can be prepared reproducibly. Such surfaces could prove useful in applications that require a high concentration of surface a ctive groups such as in ceramic membrane modification, construction of bioc ompatible surfaces, and adhesion enhancement in polymer composites.