Electropolishing of Bi2Te3 based alloys

Citation
Kc. Tewari et al., Electropolishing of Bi2Te3 based alloys, MATER CH PH, 72(1), 2001, pp. 72-76
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS CHEMISTRY AND PHYSICS
ISSN journal
02540584 → ACNP
Volume
72
Issue
1
Year of publication
2001
Pages
72 - 76
Database
ISI
SICI code
0254-0584(20011001)72:1<72:EOBBA>2.0.ZU;2-6
Abstract
Polarography has been used as a tool for controlling the electropolishing o f p-type Bi0.5Sb1.5Te3.0 and n-type Bi2Se0.3Te2.7:0.2 wt.% SbI3 semiconduct ing materials used in thermoelectric coolers at particular current density in terms of electropolished film thickness preceded by the electroetching o f these materials in suitable electrolytes, by measuring the diffusion curr ent for the reduction of Sb and Se ions at dropping mercury electrode (DME) from electropolishing electrolytes for the p-type and n-type materials res pectively. In addition, I-V measurements for correlating the current densit y with the growth of the electropolished film for these n-type and p-type s emiconductors have been carried out. (C) 2001 Elsevier Science B.V. All rig hts reserved.