Surface characterization of optical components for the DUV, VUV and EUV

Authors
Duparre, A Kozhevnikov, I Gliech, S Steinert, J Notni, G
Citation
A. Duparre et al., Surface characterization of optical components for the DUV, VUV and EUV, MICROEL ENG, 57-8, 2001, pp. 65-70
Citations number
5
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
65 - 70
Database
ISI
SICI code
0167-9317(200109)57-8:<65:SCOOCF>2.0.ZU;2-R
Abstract
Total fight scattering measurements (TS) at 248 nm, 193 nm and 157 nm, atom ic force microscopy (AFM) and X-ray scattering (XRS) are used to characteri ze optical components for the DUV/VUV and EUV regions. Power spectral densi ties (PSD) were calculated for comprehensive roughness analysis. Examples o f measurements on CaF2 substrates and fluoride multilayer coatings for DUV/ VUV applications as well as on Mo films for use in EUV optics are presented . (C) 2001 Elsevier Science B.V. All rights reserved.