Preliminary results from key experiments on sources for EUV lithography

While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is sti ll open. In a German basic research cooperation on short-wavelength plasma based sources some key issues also relevant for EUVL are addressed: the com parison of existing sources, investigations on the scalability of source co ncepts and the demonstration of key features. Preliminary results of invest igations on parameters for best conversion efficiency of laser produced pla smas, concepts for high-power lasers and scalability of gas discharge based sources are presented. Comparability of results is assured by calibrated m etrology tools which are cross checked with ASML's flying circus. (C) 2001 Elsevier Science BY All rights reserved.