LILIT beamline for soft and deep X-ray lithography at Elettra

In this paper we present the beamline for X-ray lithography installed at EL ETTRA (Trieste, Italy). The peculiarity of the beamline design consists mai nly in its wide lithographic window. This is achieved by combining high-pas s filters (Beryllium windows or other suitable material filters) with low-p ass filters (mirrors at increasing angles of incidence). The design allows to change the spectral range of interest continuously, from the soft (aroun d 1.5 keV) where we can achieve the highest lithographic resolution, to har d X-ray region (higher than 10 keV) where sensitive materials of thickness of tens of microns can be exposed. (C) 2001 Elsevier Science BY All rights reserved.