D. Stenkamp et al., Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools, MICROEL ENG, 57-8, 2001, pp. 137-143
Electron projection lithography (EPL) is one of the most promising candidat
es for next generation lithography (NGL). In this paper, we report on the r
ealization of the electron column modules for the SCALPEL high-throughput /
alpha electron projection lithography tools, designed to demonstrate high w
afer throughput at resolutions at and below 100 nm. For the illumination an
d projection systems we have opted for a highly modular set-up of each elec
tron optical component to achieve maximum flexibility and facilitate a fast
and smooth evolution towards higher throughput and resolution. A crucial p
oint for the overall tool performance is the timely availability of system
alignment and metrology strategies. Here we adapt state-of-the-art techniqu
es from light optical lens manufacturing to a maximum amount. During the wh
ole tool development strict design and process rules are applied which will
allow an easy transition of all engineering and manufacturing processes fo
r high-volume column production. (C) 2001 Elsevier Science B.V. All rights
reserved.