Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools

Electron projection lithography (EPL) is one of the most promising candidat es for next generation lithography (NGL). In this paper, we report on the r ealization of the electron column modules for the SCALPEL high-throughput / alpha electron projection lithography tools, designed to demonstrate high w afer throughput at resolutions at and below 100 nm. For the illumination an d projection systems we have opted for a highly modular set-up of each elec tron optical component to achieve maximum flexibility and facilitate a fast and smooth evolution towards higher throughput and resolution. A crucial p oint for the overall tool performance is the timely availability of system alignment and metrology strategies. Here we adapt state-of-the-art techniqu es from light optical lens manufacturing to a maximum amount. During the wh ole tool development strict design and process rules are applied which will allow an easy transition of all engineering and manufacturing processes fo r high-volume column production. (C) 2001 Elsevier Science B.V. All rights reserved.