Wafer stage assembly for ion projection lithography

Authors
Damm, C Peschel, T Risse, S Kirschstein, UC
Citation
C. Damm et al., Wafer stage assembly for ion projection lithography, MICROEL ENG, 57-8, 2001, pp. 181-185
Citations number
5
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
181 - 185
Database
ISI
SICI code
0167-9317(200109)57-8:<181:WSAFIP>2.0.ZU;2-E
Abstract
In the framework of the Ion Projection Lithography project a wafer stage wi th nanometer position stability was developed. Major components were fabric ated from glass ceramics to meet the requirements for mechanical and therma l stability as well as for minimum magnetic susceptibility. (C) 2001 Elsevi er Science B.V. All rights reserved.