Adjustment and mounting of stencil masks for ion projection lithography

Authors
Damm, C Gebhardt, A Peschel, T Kirschstein, UC
Citation
C. Damm et al., Adjustment and mounting of stencil masks for ion projection lithography, MICROEL ENG, 57-8, 2001, pp. 187-190
Citations number
2
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
187 - 190
Database
ISI
SICI code
0167-9317(200109)57-8:<187:AAMOSM>2.0.ZU;2-7
Abstract
An integrated concept for mounting and adjustment of stencil masks in ion p rojection lithography is presented. The concept relies on a geometrical des cription of the mount only. Overall position accuracies below 3 mum were ob tained. (C) 2001 Elsevier Science B.V. All rights reserved.