Mask-membrane impact on image blur in SCALPEL

Electron inelastic scattering in thin films is briefly discussed. It is fou nd that in thin films of interest the plasmon generation by an energetic el ectron is the dominant process and the electron energy loss spectra (EELS) can be described by an analytical function of the membrane thickness and th e material characteristics. A straightforward procedure using the analytica l approximation of EELS and the results obtained from it for the SCALPEL ma sk-membrane in terms of chromatic aberration evaluation and control are pre sented. (C) 2001 Published by Elsevier Science B.V.