A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies

Authors
Lin, CH Chen, HL Wang, LA
Citation
Ch. Lin et al., A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies, MICROEL ENG, 57-8, 2001, pp. 555-561
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
555 - 561
Database
ISI
SICI code
0167-9317(200109)57-8:<555:ASOAAF>2.0.ZU;2-2
Abstract
The resist adhesion property of PECVD deposited hexamethyldisiloxane (HMDSO ) films and related footing issues at the resist/BARC interface are evaluat ed. Larger work of adhesion between HMDSO films and photoresists and smalle r stresses of coated HMDSO films are shown with higher O-2/HMDSO flow rate ratios. The adhesion property of HMDSO films is significantly enhanced by a pplying O-2 plasma treatment. No footing is found in resist profiles, which is consistent with the measurement result of thermal desorbing. (C) 2001 P ublished by Elsevier Science B.V.