Direct nanoengineering and lithographic patterning of optically anisotropic thin films

Authors
Hodgekinson, I Wu, QH Arnold, M Blaikie, R
Citation
I. Hodgekinson et al., Direct nanoengineering and lithographic patterning of optically anisotropic thin films, MICROEL ENG, 57-8, 2001, pp. 833-836
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
833 - 836
Database
ISI
SICI code
0167-9317(200109)57-8:<833:DNALPO>2.0.ZU;2-W
Abstract
Biaxial and chiral thin films formed by oblique vapour deposition are patte rned using standard photolithography. In one example 5 mum wide half-wave p lates are fabricated by reactive ion etching a biaxial silicon film. (C) 20 01 Elsevier Science B.V. All rights reserved.