Formation of narrow grooves on thin metal layer by focused ion beam etching

Formation of narrow grooves in a thin metal layer was investigated which is a key in the proposed in situ focused ion beam (FIB) process to fabricate novel structures for observation of such phenomena as single electron tunne ling and giant magnetoresistance. Using a finely focused beam, narrower lin e patterns with narrower spacings were delineated on a Ge/nitrocellulose do uble layer resist. It is shown that the line spacing and length were limite d mainly by the process of peeling off of the Ge layer during the FIB etchi ng. (C) 2001 Elsevier Science B.V. All rights reserved.