Vapour supply manifold for additive nanolithography with electron beam induced deposition

Three-dimensional additive nanolithography with electron beam induced depos ition (EBID) is very well suited for generating very fine structures at ver y high resolution for single electron tunnelling (SET) applications. Many a pplications involving material deposition, etching, and high resolution for two- and three-dimensional structuring of surfaces can benefit from a nove l lithography system having material supply in the form of vapours incorpor ated and inserted into the lithography system. Such a deposition lithograph y system is developed and applied to construct deposits from nanocrystallin e materials in a maskless structure generation process. (C) 2001 Published by Elsevier Science B.V.