Electron-beam lithography patterning of magnetic nickel films

Electron beam (e-beam) lithography has been used to fabricate arrays of rec tangular and triangular shaped nickel dots. Dot dimensions range from 250 n m to 1 mum with separations of sub 100, 100 and 250 nm. The array dimension s are about I mm(2). X-ray masks to perform the dot patterning by X-ray lit hography have been fabricated too. The whole lithographic process is descri bed together with preliminary results concerning the magnetic characterisat ion of the patterned structures. (C) 2001 Elsevier Science BY All rights re served.