Two-dimensional photonic crystals produced by additive nanolithography with electron beam-induced deposition act as filters in the infrared

Authors
Koops, HWP Hoinkis, OE Honsberg, MEW Schmidt, R Blum, R Bottger, G Kuligk, A Liguda, C Eich, M
Citation
Hwp. Koops et al., Two-dimensional photonic crystals produced by additive nanolithography with electron beam-induced deposition act as filters in the infrared, MICROEL ENG, 57-8, 2001, pp. 995-1001
Citations number
15
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
57-8
Year of publication
2001
Pages
995 - 1001
Database
ISI
SICI code
0167-9317(200109)57-8:<995:TPCPBA>2.0.ZU;2-V
Abstract
Three-dimensional additive nanolithography with electron beam-induced depos ition is suited for rapid-prototyping of photonic crystals. It is used to c onstruct rods of 3 mum in height from nanocrystalline material having an as pect ratio > 15. The deposited rods have an edge roughness of 2 nm. The ref ractive index of the nanocystalline material is 2.8. The placement accuracy is 11 nm. Mirrors, band-filters and various designs are generated. Optical characterisation shows the filter action, but light loss from the PMMA wav e guide into the underlying SiO2-cladding so far limits the efficiency of t he mirrors. (C) 2001 Published by Elsevier Science B.V.