S. Hayakawa et al., Development of a compact beam intensity monitor for micro X-ray absorptionfine structure measurements, NUCL INST A, 467, 2001, pp. 901-904
A compact beam intensity monitor detecting an X-ray excited sample current
from a thin metal foil was developed for micro X-ray absorption fine struct
ure (XAFS) measurements. By utilizing gas amplification caused by the eject
ed photoelectrons or Auger electrons, the monitor can achieve better sensit
ivity than what can be realized with the ionization chamber. Fluctuation of
the beam intensity through the pinhole of 10 mum was precisely measured by
using this monitor, and the XAFS spectrum from a Ni thin foil was successf
ully measured with adequate normalization. (C) 2001 Elsevier Science B.V. A
ll rights reserved.