Planar microelectronics technology involving photolithography and highly an
isotropic plasma etching techniques, was applied to fabricate refractive an
d diffractive (kinoform) lenses. Focusing properties in terms of focus spot
and efficiency in the energy range 8-25 keV for both types of lenses were
tested at the European Synchrotron Radiation Facility (ESRF) ID22 beamline.
Focal spot of 1.5 mum with a gain of 25 was measured at 15keV. (C) 2001 El
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