Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis duri ng film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Ka pton windows and hits one of the substrates on a four-fold sample holder. T he diffracted beam, observed under a fixed diffraction angle between 3 degr ees and 10 degrees, is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic targe t. (C) 2001 Elsevier Science B.V. All rights reserved.