Deep X-ray lithography for the fabrication of microstructures at ELSA

Two beamlines at the Electron Stretcher Accelerator (ELSA) of Bonn Universi ty are dedicated for the production of microstructures by deep X-ray lithog raphy with synchrotron radiation. They are equipped with state-of-the-art X -ray scanners, maintained and used by Forschungszentrum Karlsruhe. Polymer microstructure heights between 30 and 3000 mum are manufactured regularly f or research and industrial projects, This requires different characteristic energies. Therefore, ELSA operates routinely at 1.6, 2.3 and 2.7 GeV, for high-resolution X-ray mask fabrication, deep and ultradeep X-ray lithograph y, respectively, The experimental setup. as well as the structure quality o f deep and ultra deep Xray lithographic microstructures are described. (C) 2001 Elsevier Science B.V. All rights reserved.