Strategies for optimum use of superposition diffractogram in scanning electron microscopy

Citation
E. Oho et K. Toyomura, Strategies for optimum use of superposition diffractogram in scanning electron microscopy, SCANNING, 23(5), 2001, pp. 351-356
Citations number
9
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
SCANNING
ISSN journal
01610457 → ACNP
Volume
23
Issue
5
Year of publication
2001
Pages
351 - 356
Database
ISI
SICI code
0161-0457(200109/10)23:5<351:SFOUOS>2.0.ZU;2-Z
Abstract
Characteristics of the superposition diffractogram used for precisely estim ating scanning electron microscopy (SEM) resolution are investigated. It is shown that the choice of pixel density to satisfy the sampling theorem, th e direction of scanning, the choice of image shift direction, the propertie s of the specimen, the effect of external disturbances such as vibration an d stray magnetic fields, and the effect of the window function required in the Fourier transform, are all factors which must be considered in order to make the superposition diffractogram a practical technique. An additional important improvement required to exploit fully the ability of the superpos ition diffractogram, which potentially is very high, is a special scanning movie which employs a digital scan generator, and digital image processing technology with autocorrelation functions.