A very compact type of broad beam ion source based on transformer coupled p
lasma excitation (TCP) is described. Our ion source consists of a cylindric
al RF coil surrounding the discharge vessel and a very compact, patented ma
tching unit from special ceramics capacitors attached directly to the disch
arge arrangement. However, the TCP excitation as well as the sophisticated
layout of the matching unit require an optimum source arrangement due to th
e beam parameters, the source lifetime and the performance of the RF elemen
ts. For that reason, a global discharge model was applied together with an
RF replacement circuit diagram to calculate for the optimum source layout.
An advanced plasma and beam diagnostics is used for controlling the source
performance due to beam composition, beam profile and ion energy distributi
on. In this way, our RF source is adapted to different beam requirements in
inert and reactive beam processes for etching, modification and sputter de
position. (C) 2001 Elsevier Science B.V. All rights reserved.