Fluid dynamic modelling and experimental diagnostics of an inductive high density plasma source (ICP)

A planar inductively coupled plasma source (ICP) used for diamond depositio n experiments was characterised theoretically as well as experimentally. In the typical process window (gas pressure 400 Pa) the discharge shows stron g local variations of temperature and electron density. Especially, the hom ogeneity of the plasma in dependence of the process pressure and coil confi gurations was investigated. Langmuir probe measurements for noble gas disch arges in a wide pressure range were compared with theoretical data from a r eactor model. A 2D-fluid plasma model, coupled self-consistently with an el ectrodynamic model, was used to calculate the theoretical results. Experime nt and simulation show very good agreement with a wide range of parameters. (C) 2001 Elsevier Science B.V. All rights reserved.