A model for calculating the thickness profile of TiB2 and Al multilayer coatings produced by planar magnetron sputtering

The essential requirements for industrial applications of thin film technol ogy processes by sputtering methods including high deposition rate, efficie nt target utilisation and good control of uniformity of the film thickness over a large area. The understanding of the parameters which affects the fi lm thickness distribution and the target behaviour during deposition and th e way it affects film properties will unequivocally improve coatings proper ties. This paper examines the deposition of TiB2/Al multilayer coatings for wear resistant and erosion resistant applications. The thickness distribut ion of the aluminium and titanium diboride coatings has been studied follow ing RF magnetron sputtering. A model based on point source evaporant theory has been developed successfully that predicts the thickness profile of the TiB2 and aluminium coatings. (C) 2001 Elsevier Science B.V. All rights res erved.