Mfv. Silva et Jr. Nicholls, A model for calculating the thickness profile of TiB2 and Al multilayer coatings produced by planar magnetron sputtering, SURF COAT, 142, 2001, pp. 934-938
The essential requirements for industrial applications of thin film technol
ogy processes by sputtering methods including high deposition rate, efficie
nt target utilisation and good control of uniformity of the film thickness
over a large area. The understanding of the parameters which affects the fi
lm thickness distribution and the target behaviour during deposition and th
e way it affects film properties will unequivocally improve coatings proper
ties. This paper examines the deposition of TiB2/Al multilayer coatings for
wear resistant and erosion resistant applications. The thickness distribut
ion of the aluminium and titanium diboride coatings has been studied follow
ing RF magnetron sputtering. A model based on point source evaporant theory
has been developed successfully that predicts the thickness profile of the
TiB2 and aluminium coatings. (C) 2001 Elsevier Science B.V. All rights res
erved.