A new linearly extended bifocal microwave plasma device

Citation
M. Kaiser et al., A new linearly extended bifocal microwave plasma device, SURF COAT, 142, 2001, pp. 939-942
Citations number
17
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
142
Year of publication
2001
Pages
939 - 942
Database
ISI
SICI code
0257-8972(200107)142:<939:ANLEBM>2.0.ZU;2-N
Abstract
A new kind of linearly extended plasma source was developed. The prototype of such a device was built up as a barrel with elliptical cross-section. Th is bifocal shape has two focus lines. A linearly extended microwave antenna is placed along one focus line and the sector of plasma treatment is place d along the second focus line. The antenna is a linear emitter of radial di vergent microwave radiation. In this work, a frequency of 2.45 GHz in pulse d and continuous wave (CW) mode was used. The power up to 6 kW CW and 10 kW pulsed is adjustable, pulse on/off times are variable in a wide field. The microwave is reflected by the metallic walls of the barrel and concentrate d in the second focus line apart from the antenna. There a quartz tube is p laced, that can be evaporated and filled with a working gas at a pressure b etween 10(2) and 10(5) Pa. The presented experiments have been done with Ar gon up to atmospheric pressure at a gas flow up to 6 slm. (C) 2001 Elsevier Science B.V. All rights reserved.