Ion nitriding of Al: growth kinetics and characterisation of the nitride layer

To study the kinetics of aluminium (Al) ion nitriding, a series of experime nts has been performed at fixed ion beam parameters and substrate temperatu res varied from 250 to 400 degreesC at intervals of 50 degreesC. The nitrid e layers have been analysed by nuclear reaction analysis (NRA), elastic rec oil detection analysis (ERDA), X-ray diffraction (XRD) and scanning electro n microscopy (SEM). Depending on the experimental conditions, the nitriding kinetics are either controlled by the delivery of N ions or by the diffusi on of Al atoms. Furthermore, the growth of the nitride layer is limited by poor layer adhesion. XRD analysis reveals the formation of a hexagonal AIN- phase plus a small fraction of the cubic AIN-phase. (C) 2001 Elsevier Scien ce B.V. All rights reserved.