A small-angle x-ray scattering (SAXS) technique using synchrotron radiation
as the x-ray source has been employed to characterize the microstructure o
f mesoporous silica prepared by one-pot template-directed synthesis methodo
logy. The scattering of pure silica agreed with Porod's law. The scattering
of organo-modified mesoporous silica showed a negative deviation from Poro
d's law, suggesting that an interfacial layer exists between the pores and
silica matrix. It was the organic groups comprising the interface, as shown
by Si-29 cross-polarization magic-angle spinning nuclear magnetic resonanc
e imaging (Si-2(9) CP MASNMR) and Fourier transform infrared spectroscopy (
FTIR), that caused this negative deviation of SAXS intensity from Porod's l
aw, and the average thickness of the interfacial layer could be deduced fro
m this negative deviation. Copyright (C) 2001 John Wiley & Sons, Ltd.