Nanometer-sized Si dot multilayers have been prepared by repeating a sequen
ce of low-pressure chemical vapor deposition for dot formation and thermal
oxidation for dot isolation. For the multilayer with Si dots in the range o
f 3-5 nm, the onset of photoconductivity is observable at a photon energy o
f 2 eV, corresponding to the optical absorption edge of the Si dots. This r
esult indicates that the nanometer-sized Si dot multilayers are promising a
s photoconductors that work at various wavelengths because the optical band
gap can be varied by controlling the dot size. (C) 2001 American Institute
of Physics.