A self-tuning approach to the growth of lead-containing complex oxide films
free of secondary phases was developed. Due to the volatility of lead oxid
e one can establish the process conditions when the phase purity is provide
d in spite of any fluctuations of the mass fluxes. An additional advantage
is suppression of the surface roughening with the increase of the film thic
kness providing high smoothness (S-a = 1.2-1.5 nm) at the deposition rate u
p to similar to1 mum/h. The effect is due to the quasi-liquid PbO-based sur
face layer activating the surface diffusion during the film growth. This ap
proach was successfully used for the growth of single phase epitaxial CMR L
a1-xPbxMnO3 (x = 0.1-0.6), ferroelectric PbTiO3 films, scintillator materia
l PbWO4 and the multilayers which were characterised by XRD, SEM, EDX, RBS,
HREM, AFM, electric and magnetic measurements.