MOCVD of lead-containing perovskites

Citation
Aa. Bosak et al., MOCVD of lead-containing perovskites, J PHYS IV, 11(PR3), 2001, pp. 93-99
Citations number
11
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
11
Issue
PR3
Year of publication
2001
Pages
93 - 99
Database
ISI
SICI code
1155-4339(200108)11:PR3<93:MOLP>2.0.ZU;2-G
Abstract
A self-tuning approach to the growth of lead-containing complex oxide films free of secondary phases was developed. Due to the volatility of lead oxid e one can establish the process conditions when the phase purity is provide d in spite of any fluctuations of the mass fluxes. An additional advantage is suppression of the surface roughening with the increase of the film thic kness providing high smoothness (S-a = 1.2-1.5 nm) at the deposition rate u p to similar to1 mum/h. The effect is due to the quasi-liquid PbO-based sur face layer activating the surface diffusion during the film growth. This ap proach was successfully used for the growth of single phase epitaxial CMR L a1-xPbxMnO3 (x = 0.1-0.6), ferroelectric PbTiO3 films, scintillator materia l PbWO4 and the multilayers which were characterised by XRD, SEM, EDX, RBS, HREM, AFM, electric and magnetic measurements.