Cobalt oxides are interesting materials for catalytic applications. Their d
eposition by CVD methods, however, have been rarely studied to date. In thi
s work, cobalt(Il)-acetylacetonate, Co(acac)(2), Was used as metalorganic p
recursor together with oxygen, to deposit Co3O4 on steel and silicon dioxid
e substrates in an atmospheric cold-wall CVD reactor. The morphology and gr
owth rate as a function of temperature, flow rate and oxygen partial pressu
re was studied. Growth was found between 200 and 500 degreesC. The samples
were analysed by SEM, UV-Vis spectroscopy and XRD. The morphology as well a
s the growth rate may be varied in a wide parameter range from smooth films
to dendritic growth. Some samples were also tested for their catalytic act
ivity in propane oxidation.