CVD deposition of cobalt oxide (Co3O4) from Co(acac)(2)

Citation
Ef. Rivera et al., CVD deposition of cobalt oxide (Co3O4) from Co(acac)(2), J PHYS IV, 11(PR3), 2001, pp. 629-635
Citations number
16
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
11
Issue
PR3
Year of publication
2001
Pages
629 - 635
Database
ISI
SICI code
1155-4339(200108)11:PR3<629:CDOCO(>2.0.ZU;2-9
Abstract
Cobalt oxides are interesting materials for catalytic applications. Their d eposition by CVD methods, however, have been rarely studied to date. In thi s work, cobalt(Il)-acetylacetonate, Co(acac)(2), Was used as metalorganic p recursor together with oxygen, to deposit Co3O4 on steel and silicon dioxid e substrates in an atmospheric cold-wall CVD reactor. The morphology and gr owth rate as a function of temperature, flow rate and oxygen partial pressu re was studied. Growth was found between 200 and 500 degreesC. The samples were analysed by SEM, UV-Vis spectroscopy and XRD. The morphology as well a s the growth rate may be varied in a wide parameter range from smooth films to dendritic growth. Some samples were also tested for their catalytic act ivity in propane oxidation.