Deposition by an aerosol assisted MOCVD process of Eu or Er doped Y2O3-P2O5 thin films

The deposition of Er or Eu doped Y2O3-P2O5 thin films by an aerosol assiste d MO-CVD atmospheric process is studied. 0.1 to 0.5 mum thick films were ob tained on glass substrates in the temperature range 400 degreesC-580 degree sC. The rare earth luminescence is activated by post annealing. The propert ies of the films were discussed in function of the P2O5 content. For high a nnealing post-deposition treatments the films with less than 15 Mol% P2O5 t ended to crystallise in the yttria phase. The YPO4 phase appeared around 50 Mol% P2O5. Between these concentration limits the films appeared as a diso rdered composite Y-P-O phase and exhibited wide luminescence bands.