Characterization of a solvant-free vapour source for MOCVD

A vapour source for MOCVD applications has been developed. This source pres ents a clear advantage when using solid precursors dissolved in an organic solvent. Vapour sources of solid precursors by direct heating are not repro ducible; the use of a solution of one or more components is the best way to control the mass sent to the reactor accurately. Several solutions have be en proposed to introduce the solution into the evaporation zone. In this wo rk, we present the characterization of a vapour source that allows to separ ate the solvent from the precursors before introducing the precursors vapou rs into the deposition chamber. In this way, vapours from the precursors ar e only sent to the deposition chamber.